By H. P. Bonzel, R. Denecke, W. Eck, A. Föhlisch, G. Held, W. Jaegermann, N. Martensson, T. Mayer, H. Over, H. P. Steinrück
Surface technology is known as a comparatively younger clinical self-discipline, taken with the actual and chemical houses of phenomena on fresh and coated reliable surfaces, studied below various stipulations. The adsorption of atoms and molecules on good surfaces is, for instance, this sort of situation, hooked up with kind of drastic adjustments of all floor houses. An adsorption occasion is often saw in nature and located to be of technical significance in lots of commercial methods. hence, floor technological know-how is interdisciplinary by way of its very nature, and as such a massive middleman among basic and utilized research.
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Additional info for Adsorbed Layers on surfaces
4 Fe Fig. 13. The activity of various transition metals for ammonia synthesis is shown as a function of the degree of filling the d-band [81O2]. 0 In general, the bonding of atomic nitrogen on metal surfaces is stronger than that of atomic oxygen (see Table 11). The main reason is that the valence states of N are so high that the coupling to the d states is strong enough to push anti-bonding states above the Fermi level. Although the N-metal bonding is strong, desorption temperatures are usually still quite low due to the strong internal bond of N2 (see Table 10).
3 eV disperse by more than 1 eV XPS ARUPS Ref. 95G1 88K3 85F1 78G1 82G1 theory XAS STM-LES XPS UPS XPS 85F1 84D2, 87C2, 96O1, 97C1 92W1 89P3 01U1 90R2 82S4, 90R2 95D3 PES 77T1, 80L1 UPS ARUPS SXES SXES, XAS XPS XPS ARUPS 92W2 77L2, 77T1 80L1 93T1 98W3 80P1 93S6, 79B3 85S3 ARUPS 85S3 minority spin polarized PES IPE ARPES 90C1 92H2, 95D2 85P1 vertical and horizontal bonding theory 85H1 strong dispersion(2eV) along the Cu-O chains. 2 disp. 9 disp. 4-8 Method UPS XPS ARUPS XPS XPS UPS XPS ARUPS [Ref.
5 ML 110 K - 150 K 300 K 100 K; stick. coeff. 2 77 - 500 K d); direct dissociation 91R1 78N1 73B2, 77H2, 81C1 84N1, 94G2 97D2 84N1, 96B2 79P1 AES, LEED TDS, LEED TPD, AES Mol. beam Mol. beam 92C4 90S2 85M2 97B3 98K1 XPS, LEED, TDS LEED, TDS 83F2 77K1, 96R1 Mol. beam, trapping mediated 96W3 [Ref. p. 5 ML; stick. coeff. remains even high during oxidation Ref. Mol. beam, direct chemisorption 00B2 AES KW AES, TDS, LEED AES, TDS, LEED SCLS, UPS O(2p) 01S1 77B4 80M1 98R1, 79W2 TDS AES, TDS, LEED SCS, UPS O(2p) Mol.