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By Pier Andrea Serra

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The parallel electrodes which are separated by a distance of a few centimeters may be in contact with the discharge or insulated from it by a dielectric. Gas pressures are typically in the range 1–103 Pa. In a capacitively coupled RF discharge, the electron density is in the range ne=109-1010 cm-3 and densities up to 1011 cm-3 are possible at higher frequencies. • Inductively coupled plasma (ICP) ICP is similar to CCP but the electrode consists of a coil wrapped around the discharge volume that inductively excites the plasma.

The synthesis conditions for deposition of plasma polymer films with high functional group concentration are characterized by low powers thus leading to low precursor fragmentation. This will result in the reduction of the plasma polymer film cross-linking degree [56]. However, the control of the cross-linking degree is an important factor for the optimiza‐ tion of the plasma polymer film stability and mechanical and thermal properties [72]. There‐ fore, it is important to evaluate the cross-linking degree in addition to the plasma and polymer film chemistry in order to choose the appropriate power [70, 73].

Although DBD configurations can be operated between line frequency and microwave frequencies the typical operating range for most technical DBD applications lies between 500 Hz and 500 kHz [17]. Plasma can be used in the continuous wave (CW) or pulsed mode. In the continuous wave mode, plasma with a specific power is turned on for a specific amount of time. In the pulsed mode, plasma is intermittently generated with a fixed duty cycle (Δ). Δ = t on / ( t on + t off ) (1) where ton is the time during which the plasma is turned on and toff is the time during which the plasma is turned off.

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